Kla-tencor Introduces Five Development Control Systems For The Manufacture Of Ics Below 7 Nanometers

KLA-Tencor today introduced five development control systems for logic and cutting-edge memory design nodes below 7 nm to help wafer manufacturers achieve the rigorous process tolerances required for multiple exposure techniques and EUV lithography. At the IC manufacturing facility, the ATL stacking measurement system and the SpectraFilm® F1 film measurement system provide process characterization analysis and offset monitoring for the fabrication of finFET, DRAM, 3D NAND and other complex component structures. The Teron® 640e mask inspection product line and the LMS IPRO7 mask stacking measurement system can assist the mask factory in the development and identification of EUV and advanced optical enclosures. The 5DAnalyzer X1 Advanced Data Analysis System provides the foundation for an open architecture to support fab-tailored analysis and real-time process control applications. These five new systems expose KLA-Tencor's system of diversified measurement, inspection and data analysis to identify and correct process changes from the root.

"For 7nm and 5nm design nodes, wafer manufacturers are finding stacking errors, uneven linewidths and hotspots are becoming increasingly difficult," KLA-Tencor's global product "In addition to the correction of the exposure machine, our customers are also aware of how the changes in the process of changing the mask and wafer processes affect the development of the mold.Through providing a full range of factory-wide open- Measurement and inspection data, IC engineers can quickly locate process problems and manage them directly in their place of existence.Our systems, such as the five systems introduced today, will provide our customers with cutting-edge technology to keep their The expert can reduce the imaging molding error caused by each wafer, mask and process steps.

Five new systems that support development molding control for components below 7 nanometers include:

The ATL stacking measurement system utilizes a unique adjustable laser technology with a resolution of 1 nm, and it can still automatically maintain a stable high-precision stacking error measurement in the event of a process change to support rapid technology development and Accurate wafer handling in the production process.

The SpectraFilm F1 film measurement system utilizes a new optical technology to measure high and uniform thickness and uniformity of monolayer and multilayer films to monitor the deposition process in mass production and provide bandgap data so that it does not have to wait until the production line Terminal test can predict the electrical properties of components early.

The Teron 640e mask inspection system utilizes enhanced optical, detector and algorithm functions to capture critical development and particle defects and enable high-speed detection to assist advanced photomask plants in the development and identification of EUV and optical development masks.

The LMS IPRO7 shade stacks are designed with a new operating mode to accurately measure the mask placement error within the component for a short period of time, providing a full-purpose mask for the beam electron beam direct write Identification, and in the IC manufacturing plant to reduce the mask caused by the stacking error.

The 5D Analyzer X1 data analysis system provides an extensible, open architecture that receives data from different measurement and routing tools to enable advanced analysis, characterization, and timely control of plant-wide process changes.

ATL, SpectraFilm F1, Teron 640e, LMS IPRO7 and 5D Analyzer X1 are part of KLA-Tencor's unique 5D development molding control solution. It also includes a wide range of applications for developing wafer geometric measurements, spot process measurements, line widths and components Morphometric measurements, lithography and imaging modeling, as well as systems that identify key hotspots. The world's leading IC manufacturers have begun to use ATL, SpectraFilm F1 and 5D Analyzer X1 systems to support a range of applications for imaging control. With the upgrade and new equipment installed, the Teron 640e and LMS IPRO7 further increased the number of KLA-Tencor's numerous mask inspection and measurement systems installed in the cutting-edge mask factory. ATL, SpectraFilm F1, Teron 640e, LMS IPRO7 and 5D Analyzer X1 are supported by KLA-Tencor's global integrated service network in order to maintain the high performance and high throughput required for IC manufacturing. For more information on five new systems, see Advanced Developing Exposure Control Web pages.