AS Mai And IMEC Combined Lithography Laboratory Enabled: Earlier 2025 Large -Scale Production High Na EUV

Quick Technology June 4 news, according to media reports,The Belgian Microelectronics Research Center (IMEC) and ASML announced the opening of a joint High-NA EUV Lithoghy Lab in Veldhoven, the Netherlands.

After years of careful construction and integration of the laboratory, it is now ready to be ready. It will be the world's leading logic andStorage chipManufacturers and advanced materials and equipment suppliers provide cutting -edge technical support.

The core equipment in the laboratory is a prototype high -value aperture EUV scanner (Twinscan EXE: 5000), as well as supporting processing and metering tools, which will jointly help the breakthrough of future chip manufacturing.

The opening of the joint laboratory is considered an important milestone in the process of large-scale production preparations for High-NA EUV technology.The industry expects that with the continuous maturity and popularity of this technology, large-scale mass production applications will be ushered in during 2025-2026.

It is worth mentioning that,Asley has previously publicly displayed the latest generation of High Na EUVLithographyEssenceThis lithography machine is huge, equivalent to a double -layer bus with a weight of 150 tons.

Due to its huge body shape and complex assembly process, the device needs to be loaded in 250 separate plate boxes for transportation, showing its extraordinary challenges in the manufacturing and transportation process.

Although the manufacturing cost of High Na EUV light engraved machine is high, it is revealed that its price is as high as 350 million euros (about RMB 2.7 billion), but it issemiconductorManufacturing fieldThe value is inestimable.It will become a must -have weapon for large -scale mass production in the world's three major wafer manufacturing plants to achieve large -scale mass production below 2nm.